The expansion of graphene on a steel substrate utilizing chemical vapor deposition (CVD), assisted by hydrocarbons comparable to CH4, C3H8, C2H6, and so forth. results in the formation of carbon clusters, amorphous carbon, or every other construction. These carbon species are thought-about as undesirable impurities; thus a traditional etching step is used concurrently with CVD graphene development to take away them utilizing an etching agent. In the meantime, artwork etching is a particular technique of manufacturing managed non-Euclidean and Euclidean geometries by using intricate and exact etching parameters or built-in development/etching modes. Brokers comparable to H2, O2, CH4, Ar, and others are utilized as artwork etching brokers to help the artwork etching expertise. This method can generate nanopores and customise the properties of graphene, facilitating particular purposes comparable to nanodevices, nanosensors, nanofilters, and so forth. This complete overview investigates how precursor gases concurrently induce graphene development and artwork etching throughout a chemical vapor deposition course of, leading to fantastically etched patterns. Moreover, it discusses the methods resulting in the creation of those patterns. Lastly, the challenges, makes use of, and views of those non-Euclidean and Euclidean-shaped artwork etched graphene geometries are mentioned.